Oxidation physics and metaltronics using ultra-flat copper thin film
일시 : 2023-03-29 16:00 ~
연사 : 정세영 (부산대학교 물리학과)
담당 : Prof. Dohun Kim, Prof. Sunghoon Jung
장소 : 56동105호+온라인 중계
Due to the lattice mismatch with the substrate, the crystallinity of thin films and the electron motion is hindered by numerous grain boundaries, raising the question of whether the known physical properties, including electron transport in metal thin films, hold true. However, the use of Atomic Sputtering Epitaxy (ASE) represents a pivotal step in uncovering the hidden physical properties of metal. By growing thin films like homoepitaxy, despite heteroepitaxy, a longer mean free path and coherence length of electrons is achieved, thereby unlocking diverse physical phenomena. This seminar introduces a groundbreaking approach to thin film growth, involving the use of extended atomic distance mismatch (EADM) to circumvent the challenges posed by lattice mismatches. Additionally, the novel concept of oxidation physics, treating oxidation as a vector quantity, is explored, opening up a range of possibilities. The revolutionary notion of metaltronics, which seeks to introduce semiconductor properties into metal, is also presented, offering new applications for metals beyond traditional use as electrodes. Specifically, this seminar delves into the potential of copper, a metal we believed we knew all too well.
[1] S. J. Kim et al., Seong-Gon Kim*, Young-Min Kim* & Se-Young Jeong*, Flat-surface-assisted and self-regulated oxidation resistance of Cu(111), Nature 603, 434-438, (2022).
[2] B.-G. Jung, et al., S. Kim*, and Se-Young Jeong*, Wafer-scale high-quality Ag thin film using a ZnO buffer layer for plasmonic applications, Applied Surface Science 512 145705, (2020).
[3] VL Nguyen, et al., Se-Young Jeong * and Young Hee Lee*, Layer-controlled single-crystal graphene film with stacking order via Cu-Si alloy formation, , Nature Nanotech. 15, 861-867, (2020).
[4] Taewoo Ha, et al., and Y.-M. Kim*, J. Hwang* & Se-Young Jeong*, Coherent consolidation of trillions of nucleations for mono-atom step-level flat surfaces, Nat. Commun. To be published (2023)
[5] S. J. Kim, et al., Woo Seok Choi*, Se-Young Jeong* and Young Hee Lee*, Color of Copper/Copper oxide, Adv. Mat. 202007345, (2021).